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Numerical analysis of mass transport and solution properties of nickel electrodeposited in supercritical CO2

机译:超临界CO 2 电沉积镍的质量输运和固溶特性的数值分析

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High quality films with fine grains have been reported using the novel plating method which combines the merits of traditional electroplating method with supercritical CO2 techniques. In the plating system of supercritical CO2, the optimal model was developed by Econometrics Views (EViews) software according to the effects of working pressures and temperatures on the electric resistance in emulsion, and the diffusion transport model of nickel ions was established according to the micro-trench feature. Matrix Laboratory (MATLAB) software was applied to analyse the optimization and effects. The influences of the current densities and micro-trench depths on nickel ions distribution were discussed, and the experiment of nickel electrodepositing with non-ionic surfactant Tergitol TMN 10 was investigated. The results indicate that the system exists an optimum condition for nickel electrodepositing at 16.0128 MPa and 44.9685 °C, then the resistance of emulsion is 23.4753 Ω. Under the same conditions, the effect of working pressure on the resistance of emulsion is more significant than that of working temperature. For an aspect ratio of 4, the nickel ions mass transport gradually approach a steady state with the depositing time increasing. The higher uniformity and smoother surface of nickel plated films can be obtained in supercritical CO2 at 10 MPa and 50 °C, the average Vickers hardness of nickel films is 701.2 Hv.
机译:已经报道了使用新颖的电镀方法结合了传统电镀方法与超临界CO 2 技术的优点的高质量细晶粒膜。在超临界CO 2 的电镀系统中,根据工作压力和温度对乳化液电阻的影响,采用Econometrics Views(EViews)软件开发了最佳模型。根据微沟特征建立了镍离子。应用矩阵实验室(MATLAB)软件来分析优化和效果。讨论了电流密度和微沟槽深度对镍离子分布的影响,并研究了非离子表面活性剂Tergitol TMN 10电沉积镍的实验。结果表明,该体系在16.0128 MPa和44.9685°C下存在镍电沉积的最佳条件,乳化电阻为23.4753Ω。在相同条件下,工作压力对乳液电阻的影响比工作温度的影响更大。对于纵横比为4的情况,随着沉积时间的增加,镍离子的质量传输逐渐接近稳态。在10 MPa和50°C的超临界CO 2 中可以获得更高的均匀度和镀镍膜表面光滑度,镍膜的平均维氏硬度为701.2 Hv。

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