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Erbium Doped Materials for a Si-based Microphotonics

机译:硅基光子学的掺Do材料

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We have investigated the role of the Si excess on the photoluminescence properties of Er doped substoichiometric SiO_x layers. We demonstrate that the Si excess has two competing roles: when agglomerated to form Si nanoclusters (Si-nc) it enhances the Er excitation efficiency but it also introduces new non-radiative decay channels. When Er is excited through an energy transfer from Si-nc, the beneficial effect on the enhanced excitation efficiency prevails and the Er emission increases with increasing Si content. Nevertheless the maximum excited Er fraction is only of the order of percent. In order to increase the concentration of excited Er ions, a different approach based on Er silicate thin film has been explored. Under proper annealing conditions, an efficient luminescence at 1535 nm is found and all of the Er ions in the material is optically active. The possibility to efficiently excite Er ions also through electron-hole mediated processes is demonstrated in nanometer-scale Er-Si-O/Si multilayers. These data are presented and discussed.
机译:我们已经研究了过量Si对Er掺杂的亚化学计量SiO_x层的光致发光性质的作用。我们证明了过量的Si具有两个竞争作用:当聚集成Si纳米团簇(Si-nc)时,它提高了Er激发效率,但同时引入了新的非辐射衰变通道。当通过从Si-nc进行能量转移来激发Er时,对增强的激发效率的有利影响将占上风,并且Er的发射随Si含量的增加而增加。然而,最大的激发Er分数仅为百分之几。为了增加激发的Er离子的浓度,已经研究了基于Er硅酸盐薄膜的不同方法。在适当的退火条件下,发现在1535 nm处有效发光,并且材料中的所有Er离子均具有光学活性。在纳米级的Er-Si-O / Si多层膜中,也证明了通过电子空穴介导的过程有效激发Er离子的可能性。这些数据进行了介绍和讨论。

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