THE EFFECT OF Ni IONS IMPLANTATION ON THEELECTROCHEMICAL PROPERTIES OF ALUMINUM ANODICOXIDE FILMS

摘要

The implantation of Ni ions was carried out using a MEVVA source at an energy of 40 keV anddoses of 1.0×10 17 and 5.0×10 17 ions/cm 2. electrochemical impedance spectroscopy (EIS) andpotentiodynamic polarization were used to study the influences of the ions implantations on the corrosionbehavior of anodic oxide film on 1070 aluminum in NaCl solution. The XRD investigations proved thatNi ions implantation into amorphous anodic oxide films did not lead to the formation of a crystal state.XPS analysis revealed that Ni is present in the surface of the anodic film. electrochemical results showthat anodic oxide films with the Ni ions implantation provide relatively higher corrosion resistance intesting solutions. After implantation of Ni ions, the Rp values increased and the Cp values decreased,which showed a more difficult penetration of the aggressive electrolyte into the anodic oxide filmaluminium and its less porosity. The polarization curves showed that the passive current densities ofanodic oxide films with the Ni ions implantation became lower. The influencing mechanisms of the Niions implantation on corrosion resistance of the anodic oxide film were discussed.