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Photoluminescence Study of the 1052-meV ‘O-line’optical transitions in heat-treated Czochralski Si

机译:热处理的切克劳斯基硅中1052-meV“ O线”光学跃迁的光致发光研究

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The photoluminescence (PL) transitions observed near 1052meV in heat-treated, oxygen-rich silicon have been studied extensively,and various conflicting models have been proposed. Recent investigationsexplained the origin of these transitions as being due to an isoelectroniccenter that can bind up to four electron-hole pairs [1], thus accounting tbrthe multiplicity of the lines. However, it has been questioned whether thiscenter binds up to four electron-hole pairs or rather only one or two [2].We have reexamined these transitions using temperature- and excitation-density dependent PL measurements, over a much wider range ofexcitation-densities than was previously possible.
机译:在经过热处理的富氧硅中,在1052meV附近观察到的光致发光(PL)跃迁已得到广泛研究,并提出了各种相互矛盾的模型。最近的研究解释了这些跃迁的起源是由于一个等电中心可以绑定多达四个电子-空穴对[1],因此可以解释这些线的多样性。然而,有人质疑这个中心是否最多束缚四个电子-空穴对,或者仅束缚一个或两个[2]。我们已经在更宽的激发密度范围内使用温度和激发密度相关的PL测量重新检查了这些跃迁。比以前可能的要多。

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