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Weak localisation and the “destruction” of thetwo-dimensional metallic behaviour by a parallelmagnetic field

机译:弱磁场和平行磁场对二维金属行为的“破坏”

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Metallic behaviour, defined as a drop in resistivity with decreasing temperature, insome low-density two-dimensional (2D) systems appears to contradict the predictionthat non-interacting electrons are always localised in 2D. The rise and saturation, in aparallel magnetic field B‖, of the resistivity of such a system has been interpretedby some authors as showing a transition from this anomalous “metallic” state toa fundamentally different insulating ground state. We demonstrate, using a highmobilitySi-MOSFET, that this insulator at large B‖ is due to coherent backscattering(weak localisation). At B‖ = 0, this effect also exists but is weak, at experimentaltemperatures, compared to “metallic behaviour”. At large B‖, it is stronger. Thissuggests that the difference in the low-B‖ and the high-B‖ systems may only bequantitative (and not qualitative), and that in the limit of zero temperature, bothare insulating. Instead of “destroying” the metal, B‖ only facilitates localisation.
机译:在某些低密度二维(2D)系统中,金属行为定义为电阻率随温度降低而下降,这似乎与非相互作用电子始终位于2D的预测相矛盾。一些作者将这种系统的电阻率在平行磁场B'中的上升和饱和解释为显示出从这种异常的“金属”状态到根本不同的绝缘基态的过渡。我们使用高迁移率的Si-MOSFET证明,大B'处的绝缘体是由于相干的反向散射(弱定位)引起的。在“ B” = 0时,与“金属行为”相比,在实验温度下这种影响也存在但微弱。在大B'处,强度更高。这表明低B'系统和高B'系统的差异仅是定量的(而不是定性的),并且在零温度的极限下,两者都是绝缘的。 B”不会“破坏”金属,而只是促进了本地化。

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