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Acceleration of VLSI Design Cycles with Focused Ion Beam Modifications and Electron Beam Probing

机译:聚焦离子束修饰和电子束探测加速VLSI设计周期

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摘要

In today's VLSI design arena, design cycle time is extremely important to product success. Focused Ion Beam (FIB) modification and Electron Beam (E-Beam) probing technologies can greatly reduce the design cycle time by allowing for quick detection, diagnosis and correction of design faults.
机译:在当今的VLSI设计舞台上,设计周期对于产品成功至关重要。聚焦离子束(FIB)修改和电子束(E-Beam)探测技术可允许快速检测,诊断和纠正设计故障,从而大大缩短了设计周期。

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