首页> 外文会议>Interfacial Engineering for Optimized Properties III >Compositional control and structural properties of ZnSe_(1-x)Te_x epitaxial films on lattice-matched InGaAs/InP (001) by photoassisted Metal Organic Vapor Phase Expitaxy (MOVPE)
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Compositional control and structural properties of ZnSe_(1-x)Te_x epitaxial films on lattice-matched InGaAs/InP (001) by photoassisted Metal Organic Vapor Phase Expitaxy (MOVPE)

机译:光辅助金属有机气相法(MOVPE)控制晶格匹配的InGaAs / InP(001)上的ZnSe_(1-x)Te_x外延膜的成分控制和结构性能

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摘要

We report the growth of ZnSe_(1-x)Te_x (x < 0.9) epitaxial layers using photoassisted Metal-Organic Vapor Phase Epitaxy (MOVPE) on lattice-matched InGaAs/InP (001) substrates. Ternary compositional control was studied as a function of the gas phase composition, growth temperature (360℃ - 400℃) and irradiation (12 mW/cm~2 - 48mW/cm~2). Compositional and structural data were obtained by x-ray rocking curves from 004 and 044 reflections. Lower growth temperatures increased the relative tellurium incorporation but at the expense of the growth rate.
机译:我们报道了在晶格匹配的InGaAs / InP(001)衬底上使用光辅助金属有机气相外延(MOVPE)的ZnSe_(1-x)Te_x(x <0.9)外延层的生长。研究了三元组成控制与气相组成,生长温度(360℃-400℃)和辐射(12 mW / cm〜2-48mW / cm〜2)的关系。成分和结构数据是通过004和044反射的X射线摇摆曲线获得的。较低的生长温度增加了相对的碲掺入,但以生长速率为代价。

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