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Non-Arrhenius Temperature Acceleration and Stress-Dependent Voltage Acceleration for Semiconductor Device Involving Multiple Failure Mechanisms

机译:涉及多种故障机理的半导体器件的非阿里尼乌斯温度加速和应力相关电压加速

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In this paper, we study temperature and voltage acceleration of semiconductor device with multiple intrinsic failure mechanisms involved: hot carrier injection (HCI), time dependent dielectric breakdown (TDDB) and negative bias temperature instability (NBTI). Simulation shows that system activation energy and voltage acceleration parameter depend on stress temperature and voltage. A modified Arrhenius relationship is proposed to model the temperature dependence of device lifetime at given voltage. A modified exponential model is also proposed to model the voltage dependence of device lifetime at given temperature
机译:在本文中,我们研究了涉及多种固有故障机制的半导体器件的温度和电压加速度:热载流子注入(HCI),随时间变化的介电击穿(TDDB)和负偏置温度不稳定性(NBTI)。仿真表明,系统激活能量和电压加速度参数取决于应力温度和电压。提出了一种改进的阿伦尼乌斯(Arrhenius)关系,以在给定电压下对器件寿命的温度依赖性进行建模。还提出了一种改进的指数模型来模拟给定温度下器件寿命的电压依赖性

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