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Dynamics of defect formation in annealed InP

机译:InP退火后缺陷形成的动力学

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Abstract: Dynamics of formation of defects in the annealed nominally undoped semi-insulating InP obtained by high pressure, high temperature annealing of high purity materials is proposed. Incorporated hydrogen passivates vacancy at indium site from annihilation forming fully hydrogenated indium vacancy which dissociates leaving large lattice relaxation behind, deep donors, mainly larger complexes involving phosphorus at indium site and isolated hydrogen defects are created in nominally undoped InP after annealing. Also created are acceptor levels such as vacancy at indium site. Carrier charge compensation mechanism in nominally undoped InP upon annealing at high temperature is given. Microscopic models of hydrogen related defects are given. Structural, electronic and vibrational properties of LVMs related to hydrogen as well as their temperature effect are discussed. !19
机译:摘要:提出了通过高纯度材料的高压,高温退火获得的名义上无掺杂的退火半绝缘InP的缺陷形成动力学。掺入的氢使an灭后的铟位钝化,形成完全氢化的铟空位,使空位解离,留下较大的晶格弛豫,退火后,深的施主(主要是较大的络合物,铟位处涉及磷)和名义上无掺杂的InP产生了孤立的氢缺陷。还创建了受体水平,例如铟位点的空位。给出了高温退火后名义上无掺杂的InP中的载流子电荷补偿机制。给出了氢相关缺陷的微观模型。讨论了与氢有关的LVM的结构,电子和振动特性及其温度效应。 !19

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