Refractive index engineering by fast ion implantations: a generic method for constructing multi-components electro-optical circuits

摘要

Refractive index engineering (RIEng) by ion implantations is a generic methodology for constructing multi-component integrated circuits of electrooptic and nanophotonic devices with sub-wavelength features operating in the visible - near IR wavelengths. The essence of the method is to perform spatially selective implantations for sculpting complex 3D predesigned amorphized patterns with sub-wavelength features and reduced refractive index within the volume of the substrate. A number of devices that were constructed in a substrate of potassium lithium tantalate niobate are described, including a submerged slab waveguide, an optical wire and a channel waveguide array.