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Bulk Growth and Surface Characterization of Epitaxy Ready Cadmium Zinc Telluride substrates for use in IR imaging applications

机译:外延就绪的碲化镉锌碲化镉基板的批量生长和表面表征,用于红外成像应用

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摘要

Cadmium Zinc Telluride (Cd_(1-x)Zn_xTe or CZT) is a compound semiconductor substrate material that has been used for infrared detector (IR) applications for many years. CZT is a perfect substrate for the epitaxial growth of Mercury Cadmium Telluride (Hg_(1-x)Cd_xTe or MCT) epitaxial layers and remains the material of choice for many high performance IR detectors and focal plane arrays that are used to detect across wide IR spectral bands. Critical to the fabrication of high performance MCT IR detectors is a high quality starting CZT substrate, this being a key determinant of epitaxial layer crystallinity, detectivity and ultimately device electro-optical performance. In this work we report on a new source of substrates suitable for IR detector applications, grown using the Travelling Heater Method (THM). This proven method of crystal growth has been used to manufacture high quality IR specification CZT substrates where industry requirements for IR transmission, dislocations, tellurium precipitates and copper impurity levels have been met. Results will be presented for the chemo-mechanical (CMP) polishing of CZT substrates using production tool sets that are identical to those that are used to produce epitaxy-ready surface finishes on related IR compound semiconductor materials such as GaSb and InSb. We will also discuss the requirements to scale CZT substrate manufacture and how with a new III-V like approach to both CZT crystal growth and substrate polishing, we can move towards a more standardized product and one that can ultimately deliver a standard round CZT substrate, as is the case for competing IR materials such as GaSb, InSb and InP.
机译:碲化镉锌(Cd_(1-x)Zn_xTe或CZT)是一种化合物半导体衬底材料,已被用于红外探测器(IR)多年。 CZT是碲化汞镉(Hg_(1-x)Cd_xTe或MCT)外延层外延生长的理想衬底,并且仍然是许多高性能IR探测器和焦平面阵列的首选材料,这些探测器可用于检测宽范围的IR光谱带。高质量MCT IR探测器的制造至关重要的是高质量的起始CZT基板,这是外延层结晶度,探测性以及最终器件电光性能的关键决定因素。在这项工作中,我们报告了使用行进加热器法(THM)生长的,适用于红外探测器应用的新基板来源。这种成熟的晶体生长方法已用于制造符合IR传输,位错,碲沉淀和铜杂质水平的工业要求的高质量IR规格CZT基板。将使用与在相关IR化合物半导体材料(如GaSb和InSb)上制备外延就绪表面光洁度所使用的生产工具相同的生产工具组,对CZT基板进行化学机械(CMP)抛光,将给出结果。我们还将讨论规模化CZT基板制造的要求,以及如何使用类似于III-V的新方法来进行CZT晶体生长和基板抛光,如何朝着更加标准化的产品方向发展,并最终交付标准的圆形CZT基板,与竞争性IR材料(例如GaSb,InSb和InP)一样。

著录项

  • 来源
    《Infrared Technology and Applications XLIII》|2017年|1017717.1-1017717.10|共10页
  • 会议地点 Anaheim(US)
  • 作者单位

    Galaxy Compound Semiconductors Inc. (IQE Infrared), 9922 East Montgomery Avenue,Spokane, WA 99206, USA;

    Galaxy Compound Semiconductors Inc. (IQE Infrared), 9922 East Montgomery Avenue,Spokane, WA 99206, USA;

    Galaxy Compound Semiconductors Inc. (IQE Infrared), 9922 East Montgomery Avenue,Spokane, WA 99206, USA;

    Redlen Technologies Ltd., 123-1763 Sean Heights, Saanichton, British Columbia, Canada V8M 0A5;

    Redlen Technologies Ltd., 123-1763 Sean Heights, Saanichton, British Columbia, Canada V8M 0A5;

    Redlen Technologies Ltd., 123-1763 Sean Heights, Saanichton, British Columbia, Canada V8M 0A5;

  • 会议组织
  • 原文格式 PDF
  • 正文语种 eng
  • 中图分类
  • 关键词

    cadmium zinc telluride; CZT; IR detector; epitaxy-ready; THM growth; chemo-mechanical polishing;

    机译:碲化镉锌; CZT;红外探测器外延准备THM增长;化学机械抛光;

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