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Pseudomorphic p-GexSi1-x/Si quantum-well infrared photodetectors for normal incidence operation between 20K and 77K

机译:拟态p-GexSi1-x / Si量子阱红外光电探测器,用于在20K至77K之间的垂直入射操作

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Abstract: Normal incidence spectral response and bias dependent responsivity measurements on p-type Ge$-x$/Si$-1$MIN@x$//Si quantum well infrared photodetectors reveal anomalous long wavelength photoresponse, extending out to 18 $mu@m depending on quantum well parameters. Room temperature FTIR absorptance measurements do not reveal significant absorption in this wavelength range; aside from the shorter wavelength intersubband optical transitions near 6 - 12 $mu@m in these Ge$-0.25$/Si$-0.75$/ quantum wells. Dark current induced filling of the higher-lying split-off hole state, with subsequent optical absorption, would give rise to infrared absorption in the 14 - 18 $mu@m range; however the split-off ground state to heavy-hole ground state lifetime required is $MIN@10 $mu@secs. In two-hole state structures having 300 angstroms barriers we observe dramatic increases in responsivity for bias voltage above 3 V, attributed to hot-hole transport enhancement of the photoconductive gain. This behavior is not observed in 500 angstroms barrier width structures.!12
机译:摘要:在p型Ge $ -x $ / Si $ -1 $ MIN @ x $ // Si量子阱红外光电探测器上的法向入射光谱响应和与偏压有关的响应度测量揭示了异常的长波长光响应,扩展到18 $ mu @ m取决于量子阱参数。室温FTIR吸收率测量在该波长范围内未显示出明显的吸收。在这些Ge $ -0.25 $ / Si $ -0.75 $ /量子阱中,除了较短的子带间光跃迁附近的6-12μm@ m外。暗电流引起的高处裂孔状态的填充,以及随后的光吸收,将引起14-18μm@​​ m范围内的红外吸收;但是,从基态到重孔基态的分离寿命为$ MIN @ 10 $ mu @ secs。在具有300埃势垒的两孔态结构中,我们观察到对高于3 V的偏置电压的响应度显着增加,这归因于光导增益的热空穴传输增强。在500埃的势垒宽度结构中未观察到此行为!12

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