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Development of substrate structure CdTe photovoltaic devices with performance exceeding 10%

机译:开发性能超过10%的衬底结构CdTe光伏器件

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Most work on CdTe-based solar cells has focused on devices with a superstrate structure. This focus is due to the early success of the superstrate structure in producing high-efficiency cells, problems of suitable ohmic contacts for lightly doped CdTe, and the simplicity of the structure for manufacturing. The development of the CdCl2 heat treatment boosted CdTe technology and perpetuated the use of the superstrate structure. However, despite the beneficial attributes of the superstrate structure, devices with a substrate structure are attractive both commercially and scientifically. The substrate structure eliminates the need for transparent superstrates and thus allows the use of flexible metal and possibly plastic substrates. From a scientific perspective, it allows better control in forming the junction and direct access to the junction for detailed analysis. Research on such devices has been limited. The efficiency of these devices has been limited to around 8% due to low open-circuit voltage (Voc) and fill factor. In this paper, we present our recent device development efforts at NREL on substrate-structure CdTe devices. We have found that processing parameters required to fabricate high-efficiency substrate CdTe PV devices differ from those necessary for traditional superstrate CdTe devices. We have worked on a variety of contact materials including Cu-doped ZnTe and CuxTe. We will present a comparative analysis of the performance of these contacts. In addition, we have studied the influence of fabrication parameters on junction properties. We will present an overview of our development work, which has led to CdTe devices with Voc values of more than 860 mV and NREL-confirmed efficiencies approaching 11%.
机译:基于CdTe的太阳能电池的大多数工作都集中在具有上层结构的设备上。该关注归因于上层结构在生产高效电池方面的早期成功,用于轻掺杂CdTe的合适欧姆接触的问题以及制造结构的简单性。 CdCl2热处理的发展促进了CdTe技术的发展,并永久使用了上层结构。然而,尽管具有上层结构的有益特性,但是具有上层结构的器件在商业上和科学上都是有吸引力的。基底结构消除了对透明上层板的需要,因此允许使用挠性金属基底以及可能的塑料基底。从科学的角度来看,它可以更好地控制结点的形成,并可以直接访问结点以进行详细分析。对此类设备的研究受到限制。由于低的开路电压(Voc)和填充系数,这些设备的效率已被限制在8%左右。在本文中,我们介绍了我们在NREL上对衬底结构CdTe器件的最新器件开发工作。我们已经发现,制造高效衬底CdTe PV器件所需的工艺参数不同于传统的超衬底CdTe器件所需的工艺参数。我们已经研究了多种接触材料,包括掺杂Cu的ZnTe和CuxTe。我们将对这些联系人的表现进行比较分析。另外,我们研究了制造参数对结性质的影响。我们将概述我们的开发工作,这使Vd值超过860 mV的CdTe器件和经NREL确认的效率接近11%。

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