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Measuring Pressure In Warm Dense Tungsten Plasma Created In Plasma Filled Rod-Pinch Diodes

机译:测量在等离子填充杆-捏二极管中产生的热致密钨等离子体中的压力

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The plasma is created by an intense ~ MeV electron beam that forms at the tip of a 1-mm diameter tungsten rod tapered over 15 mm to a sharp point. The beam develops after an injected plasma conducts the generator current like a short circuit for 50 ns while the current increases to 600 kA, then the PFRP impedance increases and an ~ MeV, 500 kA electron beam rapidly deposits energy at the end of the tapered rod. The energetic electrons that heat the tungsten-rod plasma also produce hard x-ray emission. The time-dependent axial and radial shapes of the x-ray distribution are diagnosed using an array of PIN diodes behind rolled edges. The x-ray distributions are assumed to match the mass distribution, an assumption to be tested using Monte-Carlo calculations. Using this assumption, the axial and radial x-ray distributions are converted to mass distributions, since the dimensions of the solid rod tip are known. The evolution of the mass distributions is determined by the internal pressure (and to a lesser extent by the external magnetic pressure). The radial distributions can be represented by Gaussian functions, and a self-similar equation of motion determines the pressure. The pressure calculated this way is many times greater than the kinetic pressure (1+Z)nkT. This could be the result of ionion repulsion in this unconventional plasma, in which the number of electrons in a Debye sphere is of order unity. Independent measurements of ionization (Z) and temperature imply the coulomb coupling factor is also much greater than one, supporting the importance of ion-ion coupling causing high internal pressure.
机译:等离子体是由强烈的MeV电子束产生的,该束电子束形成在直径1毫米的钨棒的尖端,直径超过15毫米,逐渐变尖。在注入的等离子体像短路一样在50 ns内使发生器电流发生短路时(在电流增加到600 kA时),然后在RPRP阻抗增加并且〜MeV,500 kA的电子束迅速将能量沉积到锥形棒的末端时,电子束就会形成。 。加热钨棒等离子体的高能电子也会产生硬X射线发射。 X射线分布的随时间变化的轴向和径向形状可通过滚动边缘后面的PIN二极管阵列进行诊断。假设X射线分布与质量分布匹配,这是要使用蒙特卡洛计算进行测试的假设。使用该假设,由于已知固体杆头的尺寸,因此将轴向和径向X射线分布转换为质量分布。质量分布的演变取决于内部压力(在较小程度上取决于外部磁压力)。径向分布可以用高斯函数表示,运动的自相似方程确定压力。用这种方法计算出的压力比动压(1 + Z)nkT大很多倍。这可能是这种非常规等离子体中离子排斥的结果,在该等离子体中,德拜球中的电子数量为1数量级。电离(Z)和温度的独立测量结果表明,库仑耦合因子也远大于1,这支持了引起高内部压力的离子-离子耦合的重要性。

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