Ultra-high electron beam power and energy densities using a plasma-filled rod-pinch diode

摘要

The plasma-filled rod-pinch diode is a new technique to concentrate an intense electron beam to high power and energy density. Current from a pulsed power generator (typically similar toMV, MA, 100 ns pulse duration) flows through the injected plasma, which short-circuits the diode for 10-70 ns, then the impedance increases and a large fraction of the similar toMeV electron-beam energy is deposited at the tip of a 1 mm diameter, tapered rod anode, producing a small (sub-mm diameter), intense x-ray source. The current and voltage parameters imply 20-150 mum effective anode-cathode gaps at the time of maximum radiation, much smaller gaps than can be used between metal electrodes without premature shorting. Interferometric diagnostics indicate that the current initially sweeps up plasma in a snowplow-like manner, convecting current toward the rod tip. The density distribution is more diffuse at the time of beam formation with a low-density region near the rod surface where gap formation could occur. Particle simulations of the beam formation phase are dominated by rapid field penetration along the anode and radial JxB forces leading to gap formation and high-energy beam propagation to the rod tip. Beam deposition at the rod tip produces a high thermal energy-density (similar to0.75 MJ/cm(3)), highly ionized (Zsimilar to10, Tsimilar to25 eV) expanding tungsten plasma. Potential applications of this technique include improved radiography sources, high-energy-density plasma generation, and intense 10-100 keV x-ray production for nuclear-weapon-effects testing. (C) 2004 American Institute of Physics.