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Electrochemical Analysis of Graphene Oxide and Reduced Graphene Oxide for Super Capacitor Applications

机译:超级电容器应用中氧化石墨烯和还原氧化石墨烯的电化学分析

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Graphene Oxide (GO) was successfully synthesized by following the Hummer's method and was reduced to form reduced Graphene Oxide (rGO) by using Zn metal powder. The AFM image showed smooth surface for both GO and rGO, indicating the formation of GO sheets. The reduction in lattice spacing from 0.85 to 0.36 nm in rGO is caused by the removal of the oxygen-containing functional groups bonded on the surface of the graphene layers. The defect density as well as the number of stacking in rGO is reduced as compared to GO indicated by the reduction of both ID/IG and I2D/IG ratio. As shown by the CV measurement the integrated area under the CV curve was increased with a rectangular shape for rGO and hence obtained better capacitance than GO. Hence, rGO has a better super capacitor property than GO. The impedance spectroscopy showed that the value of RCT is 21.84 and 30.54 ohm for rGO and GO respectively, indicating an increase in the charge transfer resistance for GO, and hence increased charge conductivity for rGO.
机译:遵循Hummer方法成功合成了氧化石墨烯(GO),并使用锌金属粉末将其还原形成还原的氧化石墨烯(rGO)。 AFM图像显示GO和rGO均具有光滑的表面,表明GO薄片的形成。 rGO中的晶格间距从0.85减少到0.36 nm是由于去除了在石墨烯层表面上键合的含氧官能团而引起的。与GO相比,缺陷密度以及在rGO中的堆叠数量都减少了,I / n D \ n / I \ n G \ n和I \ n 2D \ n / I \ n G < / sub> \ n比率。如CV测量所示,rGO的CV曲线下的积分面积呈矩形增加,因此比GO获得更好的电容。因此,rGO具有比GO更好的超级电容器性能。阻抗谱表明,rGO和GO的RCT值分别为21.84 ohm和30.54 ohm,表明GO的电荷转移电阻增加,因此rGO的电荷电导率增加。

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