首页> 外文会议>2019 IEEE 39th International Conference on Electronics and Nanotechnology >Preparation of CdхMn1-хTe Crystal Surface by Laser Irradiation for Formation of Barrier Structures
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Preparation of CdхMn1-хTe Crystal Surface by Laser Irradiation for Formation of Barrier Structures

机译:激光辐照制备Cd х Mn 1-х Te晶体表面以形成势垒结构

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摘要

The transformations of the morphology and surface structure of Cd1-xMnxTe crystals under the action of pulsed laser radiation and the properties of laser-optimized barrier structures on these crystals obtained by high-frequency cathode sputtering were studied. Using scanning electron (SEM) and atomic force (AFM) microscopy, it was shown that, depending on the energy density and laser pulse duration, the morphology, phase composition and distribution of the system of defects and inclusions in the surface areas of Cd1-xMnxTe crystals can be optimized. A theoretical prediction of the surface temperature and the melting threshold of Cd1-xMnxTe crystals for various laser treatment modes was made. It was shown that the quality of the laser treated surface Cd1-xMnxTe crystals (x=0.1-0.45) can be estimated from the maximum contrast of the lines in the electron channeling patterns in SEM. Active heterostructures were obtained using the RF cathode sputtering of thin CdSb, ZnSb films Cd1-xMnxTe crystals. The transformation of the polycrystalline granular structure of these films in the field of the laser action was studied using scanning images in AFM. It was found that grains coalescence processes contribute to the optimization of both the adhesion and structure of the films, as well as the electrophysical characteristics of the barrier structures.
机译:研究了Cd1-xMnxTe晶体在脉冲激光辐射作用下的形貌和表面结构的转变,以及通过高频阴极溅射获得的这些晶体的激光优化势垒结构的性质。使用扫描电子显微镜(SEM)和原子力(AFM)显微镜显示,根据能量密度和激光脉冲持续时间,Cd1-表面积中缺陷和夹杂物的体系的形态,相组成和分布可以优化xMnxTe晶体。对各种激光处理方式的Cd1-xMnxTe晶体的表面温度和熔化阈值进行了理论预测。结果表明,可以从SEM中的电子通道图形中的线的最大对比度估计激光处理过的表面Cd1-xMnxTe晶体(x = 0.1-0.45)的质量。使用薄CdSb,ZnSb薄膜Cd1-xMnxTe晶体的RF阴极溅射获得了有源异质结构。使用AFM中的扫描图像研究了这些薄膜在激光作用领域中多晶颗粒结构的转变。发现晶粒的聚结过程有助于优化膜的粘附力和结构以及阻挡层结构的电物理特性。

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  • 来源
  • 会议地点 Kiev(UA)
  • 作者单位

    Department of Physics of Semiconductors and Nanostructures, Yuriy Fedkovych Chernivtsi National University, Chernivtsi, Ukraine;

    Department of Physics of Semiconductors and Nanostructures, Yuriy Fedkovych Chernivtsi National University, Chernivtsi, Ukraine;

    Department of Physics of Semiconductors and Nanostructures, Yuriy Fedkovych Chernivtsi National University, Chernivtsi, Ukraine;

    Department of Physics of Semiconductors and Nanostructures, Yuriy Fedkovych Chernivtsi National University, Chernivtsi, Ukraine;

    Department of Physics of Semiconductors and Nanostructures, Yuriy Fedkovych Chernivtsi National University, Chernivtsi, Ukraine;

    Department of Computer Systems and Networks, Yuriy Fedkovych Chernivtsi National University, Chernivtsi, Ukraine;

    Department of General Chemistry and Chemical Material Science, Yuriy Fedkovych Chernivtsi National University, Chernivtsi, Ukraine;

  • 会议组织
  • 原文格式 PDF
  • 正文语种 eng
  • 中图分类
  • 关键词

    Crystals; Surface morphology; Surface emitting lasers; Morphology; Surface treatment; Films;

    机译:晶体;表面形态;表面发射激光;形态学;表面处理;胶片;;

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