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Surface/subsurface observation and removal mechanisms of ground reaction bonded silicon carbide

机译:地面反应结合碳化硅的表面/亚表面观察和去除机理

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摘要

Reaction Bonded Silicon Carbide (RBSiC) has long been recognized as a promising material for optical applications because of its unique combination of favorable properties and low-cost fabrication. Grinding of silicon carbide is difficult because of its high hardness and brittleness. Grinding often induces surface and subsurface damage, residual stress and other types of damage, which have great influence on the ceramic components for optical application. In this paper, surface integrity, subsurface damage and material removal mechanisms of RBSiC ground using diamond grinding wheel on creep-feed surface grinding machine are investigated. The surface and subsurface are studied with scanning electron microscopy (SEM) and optical microscopy. The effects of grinding conditions on surface and subsurface damage are discussed. This research links the surface roughness, surface and subsurface cracks to grinding parameters and provides valuable insights into the material removal mechanism and the dependence of grind induced damage on grinding conditions.
机译:反应键合碳化硅(RBSiC)长期以来一直被认为是光学应用的有前途的材料,因为它具有良好的性能和低成本的制造的独特组合。由于碳化硅的高硬度和脆性,因此很难进行研磨。研磨通常会引起表面和亚表面损伤,残余应力和其他类型的损伤,这对光学应用中的陶瓷组件具有很大的影响。本文研究了在蠕动进给平面磨床上用金刚石砂轮磨削的RBSiC的表面完整性,亚表面损伤和材料去除机理。用扫描电子显微镜(SEM)和光学显微镜研究表面和亚表面。讨论了磨削条件对表面和亚表面损伤的影响。这项研究将表面粗糙度,表面和亚表面裂纹与磨削参数相关联,并为材料去除机理以及磨削引起的损伤对磨削条件的依赖性提供了有价值的见解。

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