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Annealing behavior of the hydrogen-vacancy complex in bulk indium phosphide crystals

机译:块状磷化铟晶体中氢空位配合物的退火行为

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In order to explain the effects of hydrogen on the electrical properties of bulk indium phosphide crystals, we have performed a series of high temperature annealing studies with both undoped and iron-doped indium phosphide crystals. Our samples were annealed at 900 deg for 6, 36, and 72 hours, respectively, under a phosphorus overpressure of five atmospheres. Samples were characterized at 10 K by Fourier transform infrared absorption spectroscopy which allowed us to measure the concentrations of both the Fe~(2+) and V_(In)-H_4 defects simulataneously. Undoped samples were further characterized by the Hall effect measruements. We find in the iron-doped samples that the [Fe~(2+)]/[Fe~(3+)] ratio decreases gradually with increasing annealing time, indicating a reductionin the number of donors in the samples. In the undoped samples, annealing leads to a reduction of the free electron concentration accompanied by an increase in the 77 K mobility. The increase of the sample's mobility eliminates the possibility that the reduction of the free electron concentration is due to an increase in the concentration of the compensating acceptors. Our explanation for the observed behavior in all samples is that hydrogen acts as a donor and it diffuses out of the crystal during the annealing process. Based on our experimental data, we propose a calibration equation of [V_(In)-H_4]=4.2X10~(16) cm~(-1) x Absorbance (cm~(-1)) which is used to correlate the hydrogen-vacancy complex concentrations with the changes of the V_(In)-H_4 absorption peak in both the iron-doped and the undoped samples. Our results confirm the donor nature of the hydrogen-vacancy complex and provide strong evidence regarding the reduction mechanism of free carrier concentrations in bulk indium phosphide crystals during high temperature annealing under a phosphorus atmosphere.
机译:为了解释氢对块状磷化铟晶体电性能的影响,我们对未掺杂和铁掺杂的磷化铟晶体进行了一系列高温退火研究。我们的样品在五个大气压的磷超压下分别于900度退火6、36和72小时。样品通过傅立叶变换红外吸收光谱在10 K下表征,这使我们能够同时测量Fe〜(2+)和V_(In)-H_4缺陷的浓度。未掺杂的样品通过霍尔效应测量进一步表征。我们发现在铁掺杂的样品中,[Fe〜(2 +)] / [Fe〜(3+)]的比例随着退火时间的增加而逐渐降低,这表明样品中供体的数量减少了。在未掺杂的样品中,退火导致自由电子浓度降低,并伴随着77 K迁移率的增加。样品迁移率的增加消除了自由电子浓度降低是由于补偿受体浓度增加而引起的可能性。我们对所有样品中观察到的行为的解释是氢在退火过程中充当施主,并从晶体中扩散出去。根据我们的实验数据,我们提出了[V_(In)-H_4] = 4.2X10〜(16)cm〜(-1)x吸光度(cm〜(-1))的校正方程,用于校正氢掺杂和未掺杂样品中空位络合物的浓度随V_(In)-H_4吸收峰的变化而变化。我们的结果证实了氢空位络合物的供体性质,并为磷气氛下高温退火过程中块状磷化铟晶体中自由载流子浓度的降低机理提供了有力证据。

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