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YThe effect of hydrogen/deuterium introduction on photoluminescence of 3C-SiC crystals

机译:氢/氘导入对3C-SiC晶体光致发光的影响

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The effect of the incorporation and anncaling of deuterium in 3C-SiC on its photoluminescence is reported. A 3C-SiC crystal has been implanted with 100 keV deuterium and subsequently annealed at temperatures between 1015 deg and 1220 deg for 1 to 5 minutes. SIMS depth profiles indicate hydrogen is strongly trapped by defects generated through ion bombardment, but a gradual damage repairing occurs during annealing. Photoluminescence was measured with 488 nm Ar laser excitation for sample temepratures from 89 K to 400 K. The PL peak wavelength of 540 nm at room temeprature has shifted to 538 nm at 89 K. The peak PL intensity decreases with measurement temperature while its full width at half maximum (FWHM) exhibits an increasing trend. PL data were taken at five annealing stages. The post-implantation peak PL intensity and its integrated area increase initially with annealing temeprature and time. After the final annealing at 1218 deg for 2 minute, PL intensity and tis integrated area exhibit a decrease in level.
机译:报道了氘在3C-SiC中的掺入和消沉对其光致发光的影响。已向3C-SiC晶体中注入100 keV氘,然后在1015度至1220度之间的温度下退火1至5分钟。 SIMS深度剖面表明氢被离子轰击产生的缺陷强烈捕获,但是在退火过程中会发生逐渐的损伤修复。用488 nm Ar激光激发测量了从89 K到400 K的样品温度的光致发光。在室温下540 nm的PL峰值波长在89 K处已移至538nm。PL峰值强度随测量温度而降低,而其全宽度半高(FWHM)呈上升趋势。在五个退火阶段获取PL数据。植入后的峰值PL强度及其积分面积最初随着退火温度和时间的增加而增加。在1218度下进行2分钟的最终退火后,PL强度和tis积分面积显示出降低的水平。

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