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Study on photodamage of Mg:Er:LiNbO_3 waveguide substrate

机译:Mg:Er:LiNbO_3波导衬底的光损伤研究

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摘要

Doped 0.5mol% Er_2O_3 and (2,4,5,6)mol% MgO in LiNbO_3 crystal, Mg:Er:LiNbO_3 crystals were grown by Czochralski technique.The IR transmission spectra of those crystals were measured. The OH~- absorption peak of Mg(2mol%):Er:LiNbO_3 and Mg(4mol%):Er:LiNbO_3 at about 3486 cm~(-1),while that of Mg(5mol%):Er:LiNbO_3 and Mg(6mol%):Er:LiNbO_3 at about 3535 cm~(-1) The shifting mechanism of OH~- absorption peak was discussed based on the Li-site vacancy model. Using m-line method tested the photodamage of Mg:Er:LiNbO_3 waveguide substrate. The photodamage resistant ability of Mg:Er:LiNbO_3 is higher than that of Er:LiNbO_3. The photodamage resistant ability of Mg(5mol%):Er:LiNbO_3 waveguide substrate improves two orders than that of Er:LiNbO_3.
机译:在LiNbO_3晶体中掺入0.5mol%的Er_2O_3和(2,4,5,6)mol%的MgO,通过Czochralski技术生长Mg:Er:LiNbO_3晶体,并测量了这些晶体的红外透射光谱。 Mg(2mol%):Er:LiNbO_3和Mg(4mol%):Er:LiNbO_3的OH〜-吸收峰在约3486 cm〜(-1)处,而Mg(5mol%):Er:LiNbO_3和Mg的OH〜-吸收峰。 (6mol%):Er:LiNbO_3在约3535 cm〜(-1)处基于Li位空位模型讨论了OH〜-吸收峰的迁移机理。使用m线法测试了Mg:Er:LiNbO_3波导衬底的光损伤。 Mg:Er:LiNbO_3的抗光损伤能力高于Er:LiNbO_3。 Mg(5mol%):Er:LiNbO_3波导基板的抗光损伤能力比Er:LiNbO_3提高了两个数量级。

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