Surface Characterization of Titanium Nitride Films Prepared by Sputter and Pulsed-Laser Deposition Techniques

摘要

Thin films oftitanium nitride were prepared by two different methods, reactive sputter deposition and by pulsed-laser deposition. Surface morphologies were subsequently examined by atomic force microscopy (AFM), and surface composition was determined by x-ray photoelectron spectroscopy (XPS). The sputtered film was found to consist of a cluster-like polycrystalline structure. The pulsed-laser film had some cluster-like features, however the films were smoother with a compact, flat grain structure. The surfaces of both films contained TiO_2, Ti_3O_2, TiN_xO_y,TiN_xOH, and TiN_x as well as carbon. The sputter deposited film had greater relative concentrations of TiN_x and TiN_xO_y than did the laser deposited film. The sputter deposited film also had a greater relative amount of TiN to TiN_xO_y than did the laser deposited film, however the laser deposited film had a lower relative concentration of surface hydroxyl groups.