首页> 外文会议>Gallium nitride materials and devices X >Deep level transient spectroscopy on light-emitting diodes based on (In,Ga)N/GaN nanowire ensembles
【24h】

Deep level transient spectroscopy on light-emitting diodes based on (In,Ga)N/GaN nanowire ensembles

机译:基于(In,Ga)N / GaN纳米线集成体的发光二极管的深层瞬态光谱

获取原文
获取原文并翻译 | 示例

摘要

Ⅲ-N nanowires (NWs) are an attractive alternative to conventional planar layers as the basis for light-emitting diodes (LEDs). In fact, the NW geometry enables the growth of (In,Ga)N/GaN heterostructures with high indium content and without extended defects regardless of the substrate. Despite these conceptual advantages, the NW-LEDs so far reported often exhibit higher leakage currents and higher turn-on voltages than the planar LEDs. In this work, we investigate the mechanisms responsible for the unusually high leakage currents in (In,Ga)N/GaN LEDs based on self-induced NW ensembles grown by molecular beam epitaxy on Si substrates. The temperature-dependent current-voltage (Ⅰ-Ⅴ) characteristics, acquired between 83 and 403 K, reveal that temperatures higher than 240 K may activate a further conduction process, which is not present in the low temperature range. Deep level transient spectroscopy (DLTS) measurements show the presence of electron traps, which are activated in the same temperature interval. A detailed analysis of the DLTS signal reveals the presence of two distinct deep levels with apparent activation energies close to E_c-570 meV and E_c-840 meV, and capture cross sections of about 1.0×10~(-15) cm~2 and 2×10~(-14) cm~2, respectively. These results suggest that the leakage process might be related to trap-assisted tunneling, possibly produced by point defects located in the core and/or on the sidewalls of the NWs.
机译:Ⅲ-N纳米线(NW)是作为发光二极管(LED)基础的常规平面层的一种有吸引力的替代方法。实际上,NW几何形状能够生长具有高铟含量且没有扩展缺陷的(In,Ga)N / GaN异质结构,而与衬底无关。尽管具有这些概念上的优点,但迄今为止报道的NW-LED通常比平面LED呈现更高的泄漏电流和更高的开启电压。在这项工作中,我们研究了基于(In,Ga)N / GaN LED中异常高泄漏电流的机理,该泄漏电流基于分子束外延在Si衬底上生长的自感应NW集成体。在83至403 K之间获得的随温度变化的电流-电压(Ⅰ-Ⅴ)特性表明,高于240 K的温度可能会激活进一步的传导过程,这在低温范围内是不存在的。深层瞬态光谱(DLTS)测量表明存在电子陷阱,该陷阱在相同的温度间隔内被激活。对DLTS信号的详细分析显示存在两个不同的深能级,其表观活化能接近E_c-570 meV和E_c-840 meV,并捕获约1.0×10〜(-15)cm〜2和2的横截面×10〜(-14)cm〜2这些结果表明,泄漏过程可能与陷阱辅助隧穿有关,可能是由位于NWs核心和/或侧壁上的点缺陷引起的。

著录项

相似文献

  • 外文文献
  • 中文文献
  • 专利
获取原文

客服邮箱:kefu@zhangqiaokeyan.com

京公网安备:11010802029741号 ICP备案号:京ICP备15016152号-6 六维联合信息科技 (北京) 有限公司©版权所有
  • 客服微信

  • 服务号