GROWTH SIMULATION OF IRON FILMS ON COPPER

摘要

We have used the embedded-atom method to perform molecular-dynamics simulations of iron films grown on the (111) copper surface. The iron atoms were randomly deposited, one at a time, above the surface just within the force range of the nearest surface atom. The growth mode is discussed by following the iron film coverage for an incident-atom energy ranging from 0.5 eV to 15 eV. A transition from island to layer-by-layer growth is observed as a function of incident energy. The effect of deposition rate is also studied.