Emission Mechanisms of 828 nm Infrared Rays and 147 nm Vacuum Ultraviolet Rays in Color ac Plasma Displays

摘要

From the observation of 828 nm emission and 147 nm one in surface-discharge ac Plasma Displays (PDPs), it is clarified thal differences between 828 nm emission process and 147 nm one are caused by differences the between generation process of Xe excited state and that of Xe resonant state.