首页> 外文会议>The Fifth International Display Workshops, Dec 7-9, 1998, Kobe, Japan >ZnO:Zn Phosphor Thin Films Prepared by Laser Ablation
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ZnO:Zn Phosphor Thin Films Prepared by Laser Ablation

机译:激光烧蚀制备ZnO:Zn荧光粉薄膜

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摘要

ZnO:Zn phosphor thin films have been prepared by laser ablation. The ZnO:Zn thin films are well crystallized, even they are deposited at low substrate temperature of 300 ℃ without post-annealing. The ZnO:Zn films show a strong whitish-green PL emission. It has been found that the concentration of luminescent centers in the films can be controlled by the composition of the source pellet and by the reductive gas pressure in the growth chamber.
机译:通过激光烧蚀制备了ZnO:Zn荧光粉薄膜。 ZnO:Zn薄膜即使在300℃的低基板温度下沉积也无需后退火,也能很好地结晶。 ZnO:Zn薄膜显示出强烈的发白绿色PL发射。已经发现,膜中发光中心的浓度可以通过源颗粒的组成和在生长室中的还原性气体压力来控制。

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