DEVELOPMENT AND EVALUATION OF THE ATMI CDO~(TM) 865 FOR ABATEMENT OF LOW-K PROCESS EFFLUENT

摘要

ATMI has embarked upon a product development project to determine the optimal abatement solution for 200mm and 300mm barrier low-k and ILD bulk low-k processes utilizing trimethylsilane (3MS), tetramethylsilane (4MS), tetramethylcyclotetrasiloxane (TMCTS), and dimethyldimethoxysilane (DMDMOS). Utilizing typical process flows and process chamber effluent data provided by tool OEMs or end-users, ATMI set out to optimize the CDO~(TM) Model 865 thermal/wet integrated scrubbing system for maximum abatement of process gases and their byproducts, while minimizing the production of unwanted byproducts. Via modification of an existing CDO~(TM) configuration, ATMI was able to optimize the existing hardware and operating parameters to achieve excellent abatement results. In all cases, the low-k materials were abated to below detection limits, resulting in abatement efficiencies of >99.9% for all species. Additional advantages of the CDO~(TM) 865 Low-k system included the absence of hazardous byproducts in the forms of NO_x and OF_2, as well as minimization of CO emissions. The final low-k abatement data, measured via Fourier transform infrared (FTIR) and quadrupole mass spectrometry (QMS) techniques in the ATMI applications laboratory, is presented in this report.