PLATINUM THIN FILMS OBTAINED VIA MOCVD ON QUARTZ AND CaF_2 WINDOWS AS ELECTRODE SURFACES FOR IN SITU SPECTROELECTROCHEMISTRY

摘要

Nanocrystalline platinum thin films were deposited via MOCVD (Metal Organic Chemical Vapor Deposition) on CaF2 windows using, as precursor, platinum (Ⅱ) acetylacetonate. The depositions were performed only in some well localized areas using a special brass mask. The deposits were analyzed by XPS (X-ray Photoelectron Spectroscopy) and by XRD (X-ray powder diffraction) revealing metallic platinum polycrystalline thin films with a discrete carbon and oxygen contamination on the surface that is reduced, after sputtering, in the inner layers. The IR transmittance of the deposit on the CaF_2 window and its performance as electrode suggest that this type of films is an appealing candidate as electrode surface for in situ characterization of the molecular species formed at the interface using IR Spectroscopy.