Study of nanometer-thick graphite film for high-power EUVL pellicle

摘要

Extreme ultraviolet (EUV) lithography has received much attention in the semiconductor industry as a promising candidate to extend dimensional scaling beyond 10nm. Recently EUV pellicle introduction is required to improve particle level inside scanner for EUV mass production. We demonstrate that a new pellicle material, nanometer-thick graphite film (NGF), is one of the best candidates of EUV pellicle membrane. A NGF pellicle with excellent thermal (ε≥0.4 @R.T, ＜100nm), mechanical (415MPa @～100nm), chemical and optical (24hrs durability under exposure of EUV/H_2 at 4W/cm~2 with pH_2～5Pa) properties can be a promising and superb candidate for EUV pellicle membrane compared to Si pellicles with capping layers.