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Maaterial Removal Mechanisms in Abrasive Polishing of Structured Surfaces

机译:结构性表面磨料抛光中的材料去除机理

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摘要

Abrasive polishing using pin type and wheel type polymer polishing tools is well suited for the finishing of structured surfaces. Surface roughness and form accuracy of diamond machined and precision ground steel and electroless nickel plated structured molds can be improved using this newly developed polishing process. The experiments showed that smaller relative velocities and shorter polishing times lead to decreased surface roughness values. Furthermore, different kinds of surface micro-topographies were generated by abrasive polishing depending on the polishing pressure and relative velocity. This paper reports on achievable surface quality and material removal mechanisms in abrasive polishing of structured surfaces. Wear volumes and material removal rates determined by performing analog micro-scale abrasion tests are presented. Objective of this paper is to show the potential of this new polishing process and to come to a better understanding of the material removal mechanisms in abrasive polishing of structures which is a stringent requirement for the development of a deterministic and robust polishing process.
机译:使用销钉式和轮式聚合物抛光工具进行的研磨抛光非常适合结构化表面的精加工。使用这种新开发的抛光工艺,可以改善金刚石加工和精密磨削的钢以及化学镀镍的结构化模具的表面粗糙度和形状精度。实验表明,较小的相对速度和较短的抛光时间会导致表面粗糙度值降低。此外,取决于抛光压力和相对速度,通过磨料抛光产生了不同种类的表面微观形貌。本文报道了结构化表面的研磨抛光中可达到的表面质量和材料去除机理。介绍了通过执行模拟微型磨损测试确定的磨损量和材料去除率。本文的目的是展示这种新抛光工艺的潜力,并更好地了解结构的磨料抛光中的材料去除机理,这对确定性和耐用性抛光工艺的发展是一个严格的要求。

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