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RECOMBINATION LIFETIME IN AN INTERMEDIATE BAND STRUCTURE

机译:中间带结构中的复合寿命

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摘要

Considerable interest in Quantum Dot (QD) and Intermediate Band (IB) structures has evolved in recent years principally because of the new physical properties that ensue from the modified band structure of the semiconductor material. In particular new devices may take advantage of these new properties and when applied to solar cells there is a further challenge to characterise the structure in both quantitative and qualitative terms. In this work the recombination lifetime τ_1 of carriers in the conduction and valence bands with an IB structure is determined from first principles. Analysis of the numerical solution of the derived rate equations lends itself to a qualitative analysis of the IB structure properties and the possibility of assessing structure quality.
机译:近年来,人们对量子点(QD)和中间带(IB)结构产生了相当大的兴趣,这主要是由于半导体材料的改性能带结构带来了新的物理特性。特别地,新设备可以利用这些新特性,并且当应用于太阳能电池时,在定量和定性两个方面表征结构还有进一步的挑战。在这项工作中,载流子在带IB结构的导带和价带中的复合寿命τ_1是根据第一原理确定的。分析导出的速率方程的数值解有助于进行IB结构特性的定性分析以及评估结构质量的可能性。

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