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SCRIBE-AND-BREAK FOR POST RELEASE MEMS DIE SEPARATION

机译:划线和后释放MEMS模具分离

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We describe a post release die separation process for polysilicon surface micromachines using a combination of diamond scribing and breaking. The process resulted in yields above 80% for two types of electrostatic actuators. The paper describes the experimental apparatus and optimization of the process using a four parameter design of experiments. We determined that the two key parameters in the scribe-and-break process are the scribe force and the scribe angle. We also examined the theory of crack creation during the scribing process and determined experimentally that the crack depth in silicon is consistent with the theory developed for the scribing of glass.
机译:我们描述了结合使用金刚石划线和破碎的多晶硅表面微机械的脱模后分离工艺。对于两种类型的静电执行器,该方法的收率均超过80%。本文介绍了使用四参数设计实验的实验设备和工艺优化。我们确定划线和断裂过程中的两个关键参数是划线力和划线角度。我们还检查了划线过程中产生裂纹的理论,并通过实验确定了硅中的裂纹深度与为玻璃划线而开发的理论相一致。

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