System and Process Learning in a Full-Field, High-Power EUVL Alpha Tool

摘要

Full-field imaging with a developmental projection optics box (POB1) was successfully demonstrated in the alpha-tool Engineering Test Stand (ETS) last year. Many improvements in the ETS have been made to prepare for operation as a major component of the Resource Development Center (RDC). These improvements include upgrading the optics with a lower flare, better figure, projection optics box (POB2), developing a more reliable source, implementing lower jitter stages, adding EUV sensors, and installing a more flexible control system. The net result has been improved lithographic performance, with better image quality, improved reliability, improved throughput, and scanned features of 70 nm. This paper reports on ETS system upgrades and the impact on system performance.