INVESTIGATION OF DIAMOND FILM/Al_2O_3 GROWN BY MICROWAVE PLASMA CVD

摘要

Dense diamond films have been deposited on Al_2O_3 substrates by microwave plasma chemical vapor deposition (MPCVD) technique. The results of Raman spectra measurements and X-ray diffration analysis show that the main composition of grown layer is diamond. The mechanism of the diamond deposition on Al_2O_3 and the effect of nucleation enhancement through a pretreatment of the substrate are preliminently probed.