Design and fabrication of photonic crystals in epitaxial free silicon for ultrathin solar cells

摘要

In this paper, we present the integration of an absorbing photonic crystal within a thin film photovoltaic solar cell. Optical simulations performed on a complete solar cell revealed that patterning the epitaxial crystalline silicon active layer as a 1D and 2D photonic crystal enabled to increase its integrated absorption by 37%_(abs) and 68%_(abs) between 300 nm and 1100 nm, compared to a similar but unpatterned stack. In order to fabricate such promising cells, a specific fabrication processes based on holographic lithography, inductively coupled plasma etching and reactive ion etching has been developed and implemented to obtain ultrathin patterned solar cells.