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Porous silicon luminescence study by defect imaging methods

机译:缺陷成像方法研究多孔硅发光

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Porous silicon properties were investigated employing mapping and imaging techniques. With an atomic force microscope, we have established cases where blue shifts of luminescence and surface photovoltage threshold coincide with decreasing pores diameter. More importantly, we have also established unambiguous cases where blue shift took place for increasing pores diameter. The latter observation is strong proof that the quantum size effect is not the only luminescence mechanism. Our data implies that a dominant luminescence band is often of chemical origin.
机译:使用映射和成像技术研究了多孔硅的性能。使用原子力显微镜,我们确定了发光的蓝移和表面光电压阈值与孔直径减小同时发生的情况。更重要的是,我们还确定了发生蓝移以增加孔径的明确情况。后一个观察结果有力地证明了量子尺寸效应并不是唯一的发光机理。我们的数据表明,主要的发光带通常是化学起源的。

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