RF plasma cleaning of mirror surfaces: Characterization, optimization, and surface physics aspects of plasma cleaning

摘要

In this study, we present the results from an analysis of the various aspects of the low pressure RF plasma cleaning process for the removal of graphitic carbon contamination layers deposited on different test objects. After determining the optimum parameters for a time-minimized cleaning process using an inductively coupled plasma source as well as oxygen/argon mixtures as feedstock gas, a special emphasis has been put on the characterization of the cleaned surface (Au, Ni, Rh) both in their pristine as well as in their cleaned state. This includes the physical as well as the chemical properties of the surfaces involved. Last but not least, an effort has been made to characterize/monitor the RF plasma during the cleaning procedure in order to allow for an improved process control.