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Pack Deposition of Oxidation Resistant Silicide and Aluminide Coatings on γ-TiAl

机译:γ-TiAl上抗氧化硅化物和铝化物涂层的堆积沉积

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Thermochemical analyses were undertaken for a series of pack powder mixtures for co-depositing Al and Si to form silicide and aluminide diffusion coatings on γ-TiAl by the pack cementation process. Based on the results obtained, experimental studies were carried out to identify optimum pack powder mixtures and conditions for the co-deposition process. The thermochemical calculation results suggested that co-deposition of Al and Si is possible with CrCl_3 · 6H_2O and AlCl_3 activated packs containing elemental Al and Si as depositing sources. But, experimental results obtained at 1100℃ revealed that CrCl_3 · 6H_2O is not a suitable activator for the co-depositing process. It caused a significant degree of degradation to the substrate indicated by the specimen weight losses. However, pack powder mixtures activated by AlCl_3 were successfully used to co-deposit Al and Si to form diffusion coatings on γ-TiAl at 1100℃. The coatings produced had a multi-layered structure consisting of an outer silicide layer, an inner aluminide layer of TiAl_3 and a transitional layer at the boundary between the deposited coating and the substrate. It is suggested that such coatings were formed via a sequential deposition mechanism through inward diffusion of aluminium and silicon. A discussion is presented on the parameters that need to be effectively controlled to ensure the co-deposition of Si and Al to form silicide and aluminide diffusion coatings on γ-TiAl with a coherent structure free from microcracking and spallation by the pack cementation process.
机译:对一系列填充粉末混合物进行了热化学分析,以通过填充胶结工艺在γ-TiAl上共沉积Al和Si以形成硅化物和铝化物扩散涂层。根据获得的结果,进行了实验研究,以确定最佳的包装粉末混合物和共沉积过程的条件。热化学计算结果表明,Al和Si的共沉积可以用含有元素Al和Si作为沉积源的CrCl_3·6H_2O和AlCl_3活化包装进行。但是,在1100℃下获得的实验结果表明,CrCl_3·6H_2O不是适合共沉积过程的活化剂。由样品重量损失表明,它对基材造成了很大程度的降解。然而,AlCl_3活化的填充粉末混合物已成功用于共沉积Al和Si,并在1100℃下在γ-TiAl上形成扩散涂层。产生的涂层具有多层结构,该多层结构由外硅化物层,TiAl_3的内铝化物层和在沉积的涂层和基材之间的边界处的过渡层组成。建议通过铝和硅的向内扩散通过顺序沉积机制形成这种涂层。讨论了需要有效控制的参数,以确保在γ-TiAl上形成Si和Al的共沉积以形成硅化物和铝化物扩散涂层,并且该结构具有通过填充胶结工艺而无微裂纹和散裂的连贯结构。

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