首页> 外文会议>Conference on Zinc Oxide Materials and Devices; 20080120-21,23; San Jose,CA(US) >Phosphorus doped ZnO nanowires: acceptor-related cathodoluminescence and p-type conducting FET-characteristics
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Phosphorus doped ZnO nanowires: acceptor-related cathodoluminescence and p-type conducting FET-characteristics

机译:磷掺杂的ZnO纳米线:与受体有关的阴极发光和p型导电FET特性

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Phosphorous-doped ZnO (ZnO:P) nanowires were prepared by a high-pressure pulsed laser deposition process. To extend the size range of available wires, um-thick ZnO:P microwires were grown additionally by a direct carbothermal deposition process. Low-temperature cathodoluminescence of single ZnO:P nanowires grown by both processes exhibit characteristic phosphorus acceptor-related peaks: neutral acceptor-bound exciton emission ((A~0, X), 3.356 eV), free-electron to neutral-acceptor emission ((e, A~0), 3.314 eV), and donor-to-acceptor pair emission (DAP, ~3.24 and ~3.04 eV). This proves that stable phosphorus acceptor levels have been induced into the ZnO:P nano- and microwires. From the quantitative evaluation of the spectroscopic features we deduct an acceptor binding energy of 122 meV. The ZnO:P microwires were used as channels in bottom-gate field effect transistors (FET) built on Si substrates with SiO_2 gate oxide. The electrical FET-characteristics of several wires show reproducibly clear qualitative indication for p-type conductivity for variation of gate voltage. This behavior is opposite to that of nominally undoped, n-type conducting wires investigated for comparison. The p-type conductivity was found to be stable over more than six months.
机译:通过高压脉冲激光沉积工艺制备了掺磷的ZnO(ZnO:P)纳米线。为了扩展可用线的尺寸范围,通过直接碳热沉积工艺另外生长了微米级的ZnO:P超细线。通过这两个过程生长的单个ZnO:P纳米线的低温阴极发光表现出与磷受体相关的特征峰:中性受体结合的激子发射((A〜0,X),3.356 eV),自由电子至中性受体发射( (e,A〜0),3.314 eV)和施主-受主对发射(DAP,〜3.24和〜3.04 eV)。这证明已将稳定的磷受体水平引入了ZnO:P纳米线和微线中。从光谱特征的定量评估中,我们推导出了122 meV的受体结合能。 ZnO:P微线用作底部栅场效应晶体管(FET)中的沟道,该场效应晶体管构建在具有SiO_2栅氧化物的Si衬底上。几条线的FET电气特性对栅极电压变化的p型电导率具有可重复的清晰定性指示。此行为与为比较而研究的名义上未掺杂的n型导线相反。发现p型电导率在六个月以上稳定。

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