首页> 外文会议>Conference on Surface Scattering and Diffraction for Advanced Metrology, Aug 1, 2001, San Diego, USA >Metrological characterization of an ARS sensor based on an elliptical mirror system and a calibrated CMOS photo detector array
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Metrological characterization of an ARS sensor based on an elliptical mirror system and a calibrated CMOS photo detector array

机译:基于椭圆镜系统和校准的CMOS光电探测器阵列的ARS传感器的计量学表征

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A major problem of in-situ surface characterization with angle-resolved light scatter (ARS) measurements is the fast and accurate acquisition of surface parameters with respect to industrial applications. The paper deals with design considerations and applications of an ARS sensor based on a calibrated CMOS photo detector array (CPDA) and an elliptical mirror system (EMS). In the first part of the paper the basic design approach of the ARS sensor system LARISSA will be presented. In the second part of the paper the characteristics of the CPDA and of the EMS will be discussed including considerations of design problems and solutions. In the third part of the paper experimental results from ARS measurements on PSL particles on Si wafers (particle diameters 5 μm and 10 μm) by using the CPDA will be considered in comparison with simulation results. Finally, the design progress will be summarized and the applicability of the ARS sensor will be discussed with respect to industrial applications. Future design steps for other specific applications will be outlined. This paper is a continuation of a previous paper.
机译:利用角度分辨光散射(ARS)测量进行原位表面表征的主要问题是针对工业应用快速,准确地获取表面参数。本文讨论了基于校准的CMOS光电探测器阵列(CPDA)和椭圆镜系统(EMS)的ARS传感器的设计注意事项和应用。在本文的第一部分,将介绍ARS传感器系统LARISSA的基本设计方法。在本文的第二部分中,将讨论CPDA和EMS的特性,包括设计问题和解决方案的考虑。在论文的第三部分中,将通过使用CPDA对硅晶片上的PSL颗粒(粒径分别为5μm和10μm)进行ARS测量得到的实验结果与模拟结果进行比较。最后,将总结设计进展,并就工业应用讨论ARS传感器的适用性。将概述其他特定应用程序的未来设计步骤。本文是前一篇论文的延续。

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