首页> 外文会议>Conference on Silicon-Based and Hybrid Optoelectronics Ⅳ Jan 23-24, 2002, San Jose, USA >Nano-structured Metal-Oxide-Semiconductor Devices for Efficient Band-edge Electroluminescence
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Nano-structured Metal-Oxide-Semiconductor Devices for Efficient Band-edge Electroluminescence

机译:高效带边电致发光的纳米结构金属氧化物半导体器件

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We report that electroluminescence (EL) at Si bandgap energy is significantly enhanced from the nano-structured metal-oxide-semiconductor (MOS) devices on silicon. The nano-structure is constructed by inserting SiO_2 nanoparticles with the size of 12 nm in the oxide layer. The measured EL efficiency of the nano-structured MOS devices is enhanced to be near 10~(-4), which exceeds the limitation imposed by the indirect bandgap nature of silicon. We also observed the nearly lasing behaviors such as the threshold and resonance modes in the EL characteristics. The enhanced EL efficiency is attributed to simultaneous localization of electrons and holes to form exciton by nano-structure. This causes the process of the phonon-assisted radiative recombination of electron-hole pair more like two-particle (exciton-phonon) collision than three-particle (electron-hole-phonon) collision.
机译:我们报告说,硅上的纳米结构金属氧化物半导体(MOS)器件显着增强了Si带隙能量的电致发光(EL)。通过在氧化物层中插入尺寸为12 nm的SiO_2纳米颗粒来构建纳米结构。纳米结构MOS器件的实测EL效率提高到接近10〜(-4),超过了硅的间接带隙性质所施加的限制。我们还观察到了接近激射的行为,例如EL特性中的阈值和共振模式。 EL效率的提高归因于电子和空穴的同时定位,从而通过纳米结构形成激子。这导致电子-空穴对的声子辅助辐射复合过程比三粒子(电子-空穴-声子)碰撞更像两粒子(激子-声子)碰撞。

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