首页> 外文会议>Conference on Semiconductor Lasers and Applications, Oct 15-17, 2002, Shanghai, China >Formation of Quantum Dots with Post-growth Thermal Annealing of InGaN/GaN Quantum Wells
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Formation of Quantum Dots with Post-growth Thermal Annealing of InGaN/GaN Quantum Wells

机译:InGaN / GaN量子阱的生长后热退火形成量子点

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It is shown that post-growth thermal annealing of such a sample with temperature ranging from 800 to 900℃ led to a better confinement of indium rich clusters near InGaN quantum well layers. Transmission electron microcopy (TEM) and energy filter TEM results manifested that the sizes of indium-rich QDs were reduced with increasing annealing temperature. Also, the size homogeneity was improved. Quasi-regular arrays of indium-rich QDs embedded in InGaN quantum wells were observed in the sample of 900℃ annealing. X-ray diffraction also showed the enhancement of InN relative intensity. Photoluminescence measurements revealed blue shifts of photon emission spectral peak, indicating stronger quantum confinement after thermal annealing.
机译:结果表明,这种样品在800至900℃的温度下进行生长后热退火,可以更好地限制InGaN量子阱层附近的富铟簇。透射电子显微镜(TEM)和能量过滤器TEM结果表明,随着退火温度的升高,富铟QD的尺寸减小。而且,尺寸均匀性得到改善。在900℃退火样品中观察到嵌入InGaN量子阱中的准规则的富铟量子点阵列。 X射线衍射也显示出InN相对强度的增强。光致发光测量揭示了光子发射光谱峰的蓝移,表明在热退火之后更强的量子约束。

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