首页> 外文会议>Conference on Optical Micro- and Nanometrology in Manufacturing Technology; 20040429-20040430; Strasbourg; FR >Scanning Diffraction Microscopy: far field microscopy by interferometry and diffraction combination
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Scanning Diffraction Microscopy: far field microscopy by interferometry and diffraction combination

机译:扫描衍射显微镜:通过干涉法和衍射相结合的远场显微镜

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摘要

We have realized a novel optical microscope that uses the coherent superposition of diffused and diffracted beams. A laser emitting at 670nm is illuminating at oblique incidence the sample surface while a sharp metallic tip is partially obstructing the beam. The coherent superposition of diffracted radiation, coming from the tip sample region, and the reference beam, diffused by the whole surface, is collected in the far field during XY scan, obtained moving the sample only. The aperture between the tip, kept fixed at a working distance of the order of 20μm, and the local surface topography realizes a variable diffracting aperture, producing an intensity variations at the detector plane. We show clear images of a test structure with a resolution better than λ/10. A simple model is used and it is shown to be able to explain the obtained results.
机译:我们已经实现了一种新颖的光学显微镜,该光学显微镜使用了散射光束和衍射光束的相干叠加。 670nm处发射的激光以倾斜入射的方式照亮样品表面,同时尖锐的金属尖端部分遮挡了光束。来自尖端样品区域的衍射辐射和整个表面扩散的参考光束的相干叠加在XY扫描过程中被收集在远场中,仅使样品移动。尖端之间的孔径保持在20μm左右的工作距离,并且局部表面形貌实现了可变的衍射孔径,从而在检测器平面上产生了强度变化。我们显示了分辨率高于λ/ 10的测试结构的清晰图像。使用了一个简单的模型,它可以说明所获得的结果。

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