Scatter Measurements of Narrow Band Pass Filters

机译：窄带通滤波器的散射测量

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摘要

The scattering behavior for narrow band pass filters processed by ion beam sputtering was evaluated and compared to that of a Corning proprietary process. Results showed no significant difference in scattering for the different processes.

机译：对通过离子束溅射处理的窄带通滤光片的散射行为进行了评估，并将其与康宁专有工艺的散射行为进行了比较。结果表明，不同过程的散射无显着差异。

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来源
《Conference on Optical Interference Coatings: Postconference Digest, Jul 16-20, 2001》|2001年|p.WA6.1-6.3|共3页
会议地点
作者
Paula Holmes; David Dawson-Elli; Ralf Faber; Erik Schwendeman; Keqi Zhang;
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作者单位

Corning NetOptix, 164 Locke Drive, Marlboro, MA 01752, USA;

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会议组织
原文格式 PDF
正文语种 eng
中图分类化学工业;
关键词
scattering; thin films;

机译：散射;薄膜;
入库时间 2022-08-26 14:12:21

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Scatter Measurements of Narrow Band Pass Filters

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