首页> 外文会议>Conference on MOEMS and Miniaturized Systems III, Jan 27-29, 2003, San Jose, California, USA >A Micromachined VOA with Perpendicularly Aligned Tapered Optic Fibers
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A Micromachined VOA with Perpendicularly Aligned Tapered Optic Fibers

机译:具有垂直排列的锥形光纤的微机械VOA

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Two new micromachined VOAs(Variable Optical Attenuator), which have a micromirror with ultra -smooth surface, are presented and are compared with each other with respect to each different actuator type with same mirror structure. A couple of tapered fibers are perpendicularly aligned using the reflection of a micromirror. By moving the micromirror parallel or vertical direction to the mirror surface, some part of transmitting light can be attenuated with the principle of leaked light or misaligned light. This paper shows the two features of performance of the new two type VOAs. The one is that a micromirror with ultra-smooth surface gives the good optical performances of the VOA and the second is that the two new type VOAs have different the optical characteristics, such as polarization dependent loss(PDL), wave dependent loss(WDL) and return loss(RL), because of the different optical path or different optical attenuated method by different actuator. In this paper, the structure of reflector type VOA is fabricated using silicon micromachining process. Using SOI(silicon-on-insulator) wafer with 80 μm device layer and 3 μm oxide layer, structure is patterned by ICP (Inductively Coupled Plasma) deep etch process which is followd by thermal oxidation for improved surface roughness, HF oxide layer etching, releasing and Au sputtering to form mirror surfaces and interconnection pads. This paper pays attention to the importance of the final optical fibe alignment, whic may play a key role in the optical performance of the VOA.
机译:介绍了两种新型的微加工的VOA(可变光学衰减器),它们具有带超光滑表面的微镜,并针对具有相同镜结构的每种不同的执行器类型进行了比较。使用微镜的反射将一对锥形光纤垂直对齐。通过使微镜平行或垂直于镜表面移动,可以根据泄漏光或未对准光的原理衰减透射光的某些部分。本文展示了新型两种VOA的性能的两个特征。一是具有超光滑表面的微镜具有良好的VOA光学性能,二是两种新型VOA具有不同的光学特性,例如偏振相关损耗(PDL),波相关损耗(WDL)由于不同的致动器具有不同的光路或不同的光衰减方法,因此产生回波损耗(RL)。本文采用硅微加工工艺制造了反射型VOA的结构。使用具有80μm器件层和3μm氧化层的SOI(绝缘体上硅)晶圆,通过ICP(感应耦合等离子体)深蚀刻工艺对结构进行构图,然后进行热氧化以改善表面粗糙度,HF氧化层蚀刻,释放和金溅射以形成镜面和互连垫。本文关注最终光纤对准的重要性,这可能在VOA的光学性能中起关键作用。

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