首页> 外文会议>Conference on MEMS/MOEMS Technologies and Applications, Oct 17-18, 2002, Shanghai, China >Research on the design-optimization and fabrication process of MEMS micro magnetometer based on tunneling effect
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Research on the design-optimization and fabrication process of MEMS micro magnetometer based on tunneling effect

机译:基于隧穿效应的MEMS微磁强计的设计优化与制造工艺研究

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摘要

The tunneling effect is a kind of quantum effect used extensively. The sensor based on tunneling effect has some advantages, such as high sensitivity, rapid response, low power consumption, low driving voltage and so on. In particular, combined with the MEMS technology, tunneling effect has shown a good application foreground in micro sensor fields. According to the quantum mechanics, such as Schordinger's equation, the theory models of tunneling effect are presented in this paper. Also the expressions of the transmission coefficient and tunneling current about the tunneling barriers are obtained. On the basis of these, a kind of MEMS micro magnetometer based on tunneling effect is presented. The mechanics model of the membrane, which is the key component and is subjected to the axial residual stress at both ends, is founded. The membrane's parameters are optimized and simulated. Some key fabrication processes of the micro magnetometer, such as silicon wafer, glass, combined plate process are developed. Further more, the prototype of the MEMS micro magnetometer based on tunneling effect is fabricated.
机译:隧道效应是一种广泛使用的量子效应。基于隧穿效应的传感器具有灵敏度高,响应速度快,功耗低,驱动电压低等优点。尤其是,结合MEMS技术,隧道效应已在微传感器领域显示出良好的应用前景。根据薛定inger方程等量子力学,提出了隧穿效应的理论模型。还获得了关于隧穿势垒的传输系数和隧穿电流的表达式。在此基础上,提出了一种基于隧穿效应的MEMS微磁强计。建立了膜的力学模型,该膜是​​关键组件,两端都承受轴向残余应力。膜的参数被优化和模拟。开发了微磁力计的一些关键制造工艺,例如硅片,玻璃,复合板工艺。此外,制造了基于隧道效应的MEMS微磁力计的原型。

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