首页> 外文会议>Conference on MEMS Components and Applications for Industry, Automobiles, Aerospace, and Communication II, Jan 28-29, 2003, San Jose, California, USA >The Emerging Leadership of Surface Micromachined MEMS for Wavelength Switching in Telecommunication Systems
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The Emerging Leadership of Surface Micromachined MEMS for Wavelength Switching in Telecommunication Systems

机译:电信系统中用于波长切换的表面微加工MEMS的新兴领导者

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We introduce the Network Photonics' CrossWave~(TM) as the first commercially-available, MEMS-based wavelength selective switch. The CrossWave~(TM) combines the functionality of signal demultiplexing, switching and re-multiplexing in a single all-optical operation using a dispersive element and 1-D MEMS. 1-D MEMS, where micromirrors are configured in a single array with a single mirror per wavelength, are fabricated in a standard surface micromachining process. In this paper we present three generations of micromirror designs. With proper design optimization and process improvements we have demonstrated exceptional mirror flatness (<16.2m~(-1) curvature), surface error (<λ/200) and surface roughness (<7A RMS and <4nm peak-to-valley). These values were shown to be comparable to those obtained from bulk micromachining. This excellent optical performance in combination with a CMOS-like approach of the SUMMiT IV process (currently available at a commercial foundry) have demonstrated the emerging leadership of surface micromachining for upcoming optical telecom-munication applications.
机译:我们推出了Network Photonics的CrossWave〜(TM),这是第一款可商用的,基于MEMS的波长选择开关。 CrossWaveTM使用色散元件和一维MEMS在单个全光操作中结合了信号多路分解,切换和再多路复用的功能。一维MEMS是在标准表面微加工工艺中制造的,其中微镜配置为单个阵列,每个波长具有一个镜。在本文中,我们介绍了三代微镜设计。通过适当的设计优化和工艺改进,我们证明了出色的反射镜平面度(<16.2m〜(-1)曲率),表面误差(<λ/ 200)和表面粗糙度(<7A RMS和<4nm峰谷)。这些值显示出与从批量微机械加工获得的值相当。这种出色的光学性能与SUMMiT IV工艺的CMOS类方法(目前可在商业铸造厂获得)相结合,证明了表面微加工在即将出现的光学电信应用中的新兴领导地位。

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