首页> 外文会议>Conference on Materials, Devices, and Systems for Display and Lighting, Oct 15-17, 2002, Shanghai, China >The structural properties of SnO_2: Sb transparent conducting films deposited on flexible substrates
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The structural properties of SnO_2: Sb transparent conducting films deposited on flexible substrates

机译:沉积在柔性基板上的SnO_2:Sb透明导电膜的结构特性

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Antimony doped tin oxide (SnO_2: Sb) films have been deposited on flexible substrates such as polyimide and polypropylene adipate. And the structural properties of the films have been investigated. The XRD measurements reveal that all of the obtained films were polycrystalline with the rutile structure. With increasing the substrate temperature and film thickness, the crystallinity of the resulting films is improved and the crystalline size becomes larger. The substrate temperature and film thickness dependence of crystallinity for the SnO_2 Sb films were further revealed by their atomic force micrographs (AFM), which is consistent with the XRD observations. The XPS details of the SnO_2: Sb films are also given. The tin core levels Sn 3d_(5/2) and Sn 3d_(3/2) are observed at 486.5 and 494.9 eV, respectively, while the O 1s peak is obtained at 530.6 eV. It can be seen that the oxygen peak in the spectra is asymmetric, which is due to the concealed Sb 3d peak. The gap between the Sn 3d_(5/2) and Sn 3d_(3/2) levels (8.4 eV) is approximately the same as in the standard spectrum of Sn.
机译:锑掺杂的氧化锡(SnO_2:Sb)膜已沉积在柔性基材(如聚酰亚胺和己二酸聚丙烯酯)上。并对薄膜的结构性能进行了研究。 XRD测量表明,所有获得的膜都是具有金红石结构的多晶。随着基底温度和膜厚度的增加,所得膜的结晶度提高,并且晶体尺寸变大。 SnO_2Sb薄膜的基体温度和结晶度对薄膜厚度的依赖性通过其原子力显微镜(AFM)进一步揭示,这与XRD观察一致。还给出了SnO_2:Sb薄膜的XPS详细信息。在486.5和494.9 eV处分别观察到锡芯能级Sn 3d_(5/2)和Sn 3d_(3/2),而在530.6 eV处获得O 1s峰。可以看出,光谱中的氧峰是不对称的,这是由于Sb 3d峰隐藏了。 Sn 3d_(5/2)和Sn 3d_(3/2)能级之间的间隙(8.4 eV)与Sn的标准光谱中的间隙大致相同。

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