首页> 外文会议>Conference on Laser Micromachining for Optoelectronic Device Fabrication Oct 30, 2002 Brugge, Belgium >A practical study of the effects of exposure conditions on the quality of fibre Bragg gratings written with excimer and argon-ion lasers
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A practical study of the effects of exposure conditions on the quality of fibre Bragg gratings written with excimer and argon-ion lasers

机译:准分子激光和氩离子激光对曝光条件对光纤布拉格光栅质量影响的实践研究

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摘要

An experimental study is presented which evaluates the effects of various important exposure parameters on the quality of fibre Bragg gratings. The parameters addressed include laser repetition rate, fluence and intensity, total exposure dose, numbers of shots, fibre-mask separation and beam scanning speed. In the case of excimer laser writing of gratings, it is seen that the balance between exposure fluence and total dose is crucial in how strong a grating can written and its writing time. It is also observed that the laser repetition rate does not affect the grating quality and that a fibre-mask separation of around 50-200μm is desirable for optimum gratings. The changes in grating quality with argon ion beam scanning speed and exposure power are presented.
机译:提出了一项实验研究,评估了各种重要的曝光参数对光纤布拉格光栅质量的影响。所涉及的参数包括激光重复率,注量和强度,总曝光剂量,发射次数,光纤掩模分离和光束扫描速度。在用准分子激光写入光栅的情况下,可以看出曝光通量和总剂量之间的平衡对于光栅可以写入的强度及其写入时间至关重要。还可以观察到,激光的重复频率不会影响光栅的质量,对于最佳光栅而言,理想的光纤掩模间距约为50-200μm。提出了光栅质量随氩离子束扫描速度和曝光功率的变化。

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