首页> 外文会议>Conference on Laser Micromachining for Optoelectronic Device Fabrication Oct 30, 2002 Brugge, Belgium >Laser micromachining of thin films for optoelectronic devices and packages
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Laser micromachining of thin films for optoelectronic devices and packages

机译:光电器件和封装薄膜的激光微加工

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Focused laser micromachining in an optical microscope system is used to prototype packages for optoelectronic devices and to investigate new materials with potential applications in packaging. Micromachined thin films are proposed as mechanical components to locate fibres and other optical and electrical components on opto-assemblies. This paper reports prototype structures which are micromachined in silicon carbide to produce beams 5μm thick by (ⅰ) laser cutting a track in a SiC coated Si wafer, (ⅱ) undercutting by anisotropic silicon etching using KOH in water, and (ⅲ) trimming if necessary with the laser system. This approach has the advantage of fast turn around and proof of concept. Mechanical test data are obtained from the prototype SiC beam package structures by testing with a stylus profilometer. The Youngs modulus obtained for chemical vapour deposited silicon carbide is 360 +/- SO GPa indicating that it is a promising material for packaging applications.
机译:光学显微镜系统中的聚焦激光微加工用于为光电设备封装原型,并研究在包装中具有潜在应用的新材料。提议将微加工的薄膜作为机械组件,以将光导纤维和其他光学和电气组件定位在光电组件上。本文报告了原型结构,这些结构在碳化硅中进行了微加工,以通过以下方式产生5μm厚的光束:(ⅰ)激光切割SiC涂层的硅片中的轨道,(ⅱ)使用KOH在水中通过各向异性硅蚀刻进行底切,以及激光系统必不可少的。这种方法的优点是快速周转和概念验证。通过使用测针轮廓仪进行测试,可以从原型SiC束封装结构获得机械测试数据。化学气相沉积碳化硅的杨氏模量为360 +/- SO GPa,表明它是用于包装应用的有前途的材料。

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